17–22 May 2026
marinaforum REGENSBURG
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2.047 Erosion behaviour of compact and porous boron layers exposed to deuterium plasma in the GyM linear device

19 May 2026, 16:20
3h
Poster B. Material Erosion, Migration, Mixing, and Dust Formation Postersession 2

Speaker

Andrea Uccello (Consiglio Nazionale delle Ricerche, Istituto per la Scienza e Tecnologia dei Plasmi (CNR-ISTP))

Description

As part of ITER’s 2023 re-baselining, the first-wall material was changed from beryllium to tungsten. The absence of the beneficial ability of Be to getter low-Z impurities like oxygen will be compensated by covering the armour tiles with a boron layer of 10-100 nm (boronisation). Broadening the understanding of physics behind B erosion and re/co-deposition is a top priority for ITER to effectively control plasma-wall interactions.

This work investigates erosion of pulsed-laser deposited B coatings: 100 nm compact films (35% porosity), representing pristine B layers, on mirror-polished W substrates, and 1-8 $\mu$m porous films (50-95% porosity), mimicking re-deposits, on silicon wafers. B model systems were exposed to deuterium plasma in the GyM linear device under ITER first-wall-relevant conditions (3-4e20 m$^{-2}$s$^{-1}$ ion flux).

Within the EUROfusion work-programme, thin B films were exposed to E$_{ion}$=76 eV for comparison with experiments in PSI-2, on RF-magnetron-sputtered coatings [1], and in a D$^+$ source, on plasma-sprayed coatings [2]. Here, a low ion fluence $\Phi$=4e23 m$^{-2}$ was selected to avoid complete layer erosion. After exposure, samples were characterised using mass loss, AFM, SEM, ToF-ERDA, ToF-MEIS, SIMS, Raman spectroscopy, and XPS.

Regarding the pristine B layer, SIMS data interpretation was hindered by partial oxidation and is being disentangled through comparison with pure B samples and related compounds. ToF-ERDA shows $\sim$13.3 at.% of oxygen. Combining areal density ($\sigma$) and film thickness, a calculated mass density of 2.39 g/cm$^3$ is obtained. Post-exposure, $\sigma$ corresponds to 6.8 nm. High-resolution ToF-MEIS analysis indicates W at the surface, suggesting its incorporation into the B-O layer. The effective sputtering yield (Y$_{eff}$) agrees within a few percent with [1–2], despite differences in layer structure and a two-orders-of-magnitude variation in ion flux.

Porous B films were exposed to E$_{ion}$=43-223 eV and $\Phi$=7.0e23-2.8e24 m$^{-2}$. Y$_{eff}$ of all layers, notwithstanding differing morphologies, is generally within 20% of SDTrimSP results for E$_{ion}$>43 eV, while at 43 eV it reaches up to four times higher, possibly due to ion-assisted chemical erosion at 550 K. The limited sensitivity of Y$_{eff}$ to film morphology may, for instance, have important implications for plasma-cleaning of B-based re/co-deposits on ITER first-wall optical diagnostic mirrors. Although the structure and porosity of re/co-deposits may vary depending on mirror location in the vessel, their erosion rates are expected to be similar, potentially enabling a single plasma-cleaning strategy for all optical diagnostics.

[1] M.Sackers, et al., Nucl. Mater. Energy 45(2025)102003
[2] E.Hechtl, et al., J. Nucl. Mater. 196-198(1992)713-6

Authors

Andrea Uccello (Consiglio Nazionale delle Ricerche, Istituto per la Scienza e Tecnologia dei Plasmi (CNR-ISTP)) Anna Cremona (Consiglio Nazionale delle Ricerche, Istituto per la Scienza e Tecnologia dei Plasmi (CNR-ISTP)) Francesco Ghezzi (Consiglio Nazionale delle Ricerche, Istituto per la Scienza e Tecnologia dei Plasmi (CNR-ISTP)) Matteo Pedroni (Consiglio Nazionale delle Ricerche, Istituto per la Scienza e Tecnologia dei Plasmi (CNR-ISTP)) Gabriele Alberti (Politecnico di Milano) David Dellasega (Politecnico di Milano) Federico Gaspari (Politecnico di Milano) Alessandro Maffini (Politecnico di Milano) Davide Orecchia (Politecnico di Milano) Matteo Passoni (Politecnico di Milano) Daniel Alegre Castro (CIEMAT) Guiomar Delgado Soria (CIEMAT) Maria Gonzalez Viada (CIEMAT) Antti Hakola (VTT) Cedric Pardanaud (Aix-Marseille University) Eduardo Pitthan (Uppsala University) Radek Holenak (Uppsala University) Daniel Primetzhofer (Uppsala University)

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